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KMID : 0381920090390040349
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Korean Journal of Microscopy
2009 Volume.39 No. 4 p.349 ~ p.354
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Three Dimensional Reconstruction of Structural Defect of Thin Film Transistor Device by using Dual-Beam Focused Ion Beam and Scanning Electron Microscopy
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Kim Ji-Soo
Lee Seok-Ryoul
Lee Lim-Soo
Kim Jae-Yeal
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Abstract
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In this paper we have constructed three dimensional images and examined structural failure on thin film transistor (TFT) liquid crystal display (LCD) by using dual-beam focused ion beam (FIB) and IMOD software. Specimen was sectioned with dual-beam focused ion beam. Series of two dimensional images were obtained by scanning electron microscopy. Three dimensional reconstruction was constructed from them by using IMOD software. The short defect between Gate layer and Data layer was found from the result of three dimensional reconstruction. That phenomena made the function of the gate lost and data signal supplied to the electrode though the Drain continuously. That signal made continuous line defect. The result of the three dimensional reconstruction, serial section, SEM imaging by using the FIB will be the foundation of the next advanced study.
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KEYWORD
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Three dimensional reconstruction, FIB, SEM, TFT-LCD
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